X – Ray Diffraction Laser THERMO LOGG Contact Angle Analyzer Langmuir – Blodgett Film Deposition Scanning Electron Microscope with EDS (X-ray spectrometry) Small Angle X-Ray Scattering Apparatus Wide Angle X-Ray Scattering Apparatus Mercury Porosimeter Mass Spectrometer Nitrogen Porosimeter ultra-microtome AA GC-MS Scanning Electron Microscope with EDS (X-ray spectrometry) Proteome analysis [Proteomics] Remote Measurement System Transmission Electron Microscope CNC ΑGIECharmilles ΑCTSPARK FW-1P [CNC AGIE] CNC DMG CTX 510 Eco PHOTRON FASTACAM SA3 INSTRON 8801 Testing Device ROMER OMEGA R-SCAN & 3D RESHAPER LASER Cutter Pantograph with extra PLASMA torch CNC ΙDA XL 1200 Optical and Contact Coordinate Measuring Machine TESA MICRO-HITE 3D  RSV-150 Remote Sensing Vibrometer Ground Penetration Radar [GPR] Audio Magneto Telluric Optical Time Domain Reflectometers [OTDR] Non ion Rad Electric e-mat analysis Thermogravimetric Analyzers - Differential Scanning Calorimetry Magnetron Deposition Metal Deposition Grid Computing Center

Magnetron Deposition [MAG-DEP]

Deposition system

The table top system has a cylindrical chamber (250mm ID) and is based on a UHV conflat flange platform. The chamber has internal welds and is polished to minimise outgassing. Base ports are confocal as standard allowing a wider variety of deposition sources to be employed than with non-confocal arrangement. Numerous ports are provided for gauges and analysis tools


Contact person:

Lykoyrgos Magafas
tel. (+30) 251046267
This email address is being protected from spambots. You need JavaScript enabled to view it.


Sample Loading. In the basic system, sample entry can be made through a quick-load flange (o-ring sealed). For true UHV applications it is necessary to use a sample entry load-lock. Our load-lock uses a magnetically coupled linear/rotary transfer arm to transport samples to the main chamber.

Sample Table.The sample table/manipulator is configured as standard for 2" (52mm) samples but can be modified for samples up to 4" in diameter or multiple smaller samples.


  • Variable speed (2-20rpm) sample rotation
  • DC or RF sample table bias (DC in our case)
  • Sample heating up to 800°C
  • Z-shift (0-100mm)

The sample cradle in heated sample holders is manufactured of refractory materials to maintain system purity.

Sputtering Sources. The base ports can accommodate several sputtering sources. We can supply 1-3" magnetron sputtering sources for DC or RF operation. The sources can be equipped with standard or high-strength magnets and additionally balanced or unbalanced magnet sets. The CUSP magnetron sputter sources are the only commercially available sputter sources that are deep UHV (1x10-11Torr) compatible sources. The construction contains no elastometer seals and can be baked to 250°C. The feature of UHV compatibility enables ultra pure sputter deposition that eliminates unintentional oxidation and nitridation of materials.