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SuperK Extreme High Power Supercontinuum Laser [Laser]

The new SuperK EXTREME supercontinuum lasers represent the next generation of supercontinuum lasers that are truly turn key with industry leading brightness covering the entire 400-2400nm wavelength range.       

Contact person:

Lykoyrgos Magafas
tel. (+30) 251046267
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Due to the flexibility of the system, the SuperK EXTREME covers a broad range of applications such as Fluorescence Lifetime Imaging (FLIM)Optical Coherence Tomography (OCT), Time Correlated Single Photon Counting (TCSPC), Förster Resonance Energy Transfer (FRET), Flow cytometry, DNA sequencing, White Light Inteferometry (WLI), Test and Measurement and many others.



Blue (EXB), White (EXW) or Red (EXR) spectrum


0.1-2 W in the visible wavelength region (1-8 W total power)


On-the-fly variable repetition rate (pulse picker). The system will run at any of the following repetition rates (in MHz): 78, 39, 26, 19.5, 15.6, 13, 11.14, 9.75, 8.67, 7.8, 6.5, 5.57, 4.88, 4.33, 3.9, 3.55, 3.12, 2.89, 2.69, 2.44, 2.29, 2.11and 1.95 . The repetition rate can be changed while the system is running.


Choose between 40 or 78 MHz fixed repetition rate.


External feedback system for output power locking


Extended the normal warranty with 12 or 24 months


Software Development Kit for ultimate control of the SuperK


Deposition system

The QPrep500 system is based on a UHV, conflat flange platform. This allows true UHV to be achieved while allowing excellent chamber access through the large top-flange.
All joints are internally welded and polished on request to reduce to an absolute minimum any outgassing. Base ports are confocal as standard allowing a wider variety of deposition sources to be employed than with non-confocal arrangements.
Two side-mounting ports for high-power e-beam sources can be specified while still leaving three confocal deposition ports in the base.
The system can be equipped with pumps ranging from 300 to 1500ls-1 turbo pumps but alternative pump types can be specified.


Sample Loading
The base system is equipped with a side-entry door appropriately sized for the sample platform chosen (1" to 6" as standard, 8" on request).
Optionally, a load-lock can be mounted for clean sample transfer while leaving the main chamber under vacuum. Sample transfer is actuated via a magnetically-coupled transfer arm. Sample hand-off is enabled via a z-shift lift-off on the sample table.

Sample Table
The sample table/manipulator can be configured as standard from 2" (52mm) to 6" (or multiple smaller) samples but can be modified for a number of custom configurations.


Variable speed (2-20rpm) sample rotation

DC or RF sample table bias

Sample heating up to 800°C

Sample cooling

Z-shift (0-100mm)


The sample cradle in heated sample holders is manufactured of refractory materials


Sputtering Sources

The base ports can accommodate up to four sputtering sources. We can supply 1-4" magnetron sputtering sources for DC or RF operation. More details about our sources are available here.
Alternatively we are happy to incorporate existing or third party guns into the system.

E-beam Sources
We offer two types of e-beam evaporation sources:

Low dose, high accuracy
These are intended for highly-controlled, ultra-thin film deposition of refractory materials into the system. See more details here.

Multi kW sources
These offer high deposition rate and high capacity. Up to two larger sources (single or multi-pocket) may be installed.


Nanoparticle Sources

Our NanoGen50 nanoparticle source can be installed on the chamber to allow controlled nanoparticle deposition onto the sample. Nanoparticles can be generated from any metal as well as from many compound materials (oxides, nitrides, carbides...) and alloys. The size of the particles is highly controlled - mean between ~0.5nm and 20nm with a narrow size distribution of ±15%. More details are available here.


Atomic Sources

For the growth of oxides or nitrides at low pressure, it is often necessary to use a more reactive form of oxygen (and certainly nitrogen) to form oxide or nitride compounds. Mantis Deposition manufactures RF plasma sources which are used to generate beams of higly reactive atomic oxygen or nitrogen. These can be incorporated to act alongside conventional metal deposition sources to grow high-quality compound layers. More info can be found here.


Thermal Sources

Thermal Sources
 such as K-cells can be added. K-cells will fit through standard ports and optional, water-cooled cross-contamination shields can be added around them to improve overall system purity. More details are available here.